China Attractions Expo (CAE) now takes place in two strategic locations each year, giving even more opportunities for China’s amusement and attractions industry to flourish.
Now in its second year, CAE Shanghai takes place at the Shanghai World Expo Exhibition and Convention Centre on October 21-23, with the event set to host over 300 exhibitors in the 25,000sq.m venue.
CAE Shanghai has already attracted some of the leading exhibitors from all over the world. Forrec, Triotech, M&V and Zamperla have already confirmed their presence, while leading Chinese companies are also included, such as Golden Dragon, Golden Horse, ShiBaoliai, Zhengzhou Wolong, Shengyang C&Q and more.
CAE Shanghai will include a two-day conference, covering topics from IP to VR and indoor waterparks to FECs, as well as new technology and trends in the Chinese market. The two-day conference also includes a half day tour of the recently opened Shanghai Disneyland.
Following on from the Shanghai event, CAE Beijing will take place at the China National Convention Centre in from March 18-21, 2017. After 29 years, the show has become the premier event for the global attractions industry in the Chinese and wider Asia region.
CAE Beijing is expected to draw more than 30,000 amusement and attractions industry professionals from over 100 countries to the 35,000sq.m venue. The three-day show will host over 450 exhibitors, with more than 100 of them coming from outside of China.
Many of the world’s leading attractions industry companies will be present at CAE Beijing, including ABC, Accesso, Bolliger & Mabillard, Dream Park, Forrec, Huss, Ideattack, Intamin, Interlink, KCC, M&V, Murphys, OKE, PDC, Polin, Proslide, Sanderson, Severn Lamb, Simtec, Simworx, Triotech, Vekoma, Whitewater West, WTI, Xtrem, Zamperla, Zierer and many others.
If you have any questions, please feel free to contact Lily at email@example.com
We look forwards to seeing you at the shows.
Welcome to our blog, isn’t it AWESOME! We will update the activities of the events and magazines here.